In situ differential reflectance spectroscopy study of early stages of β-FeSi2 silicide formation

Sergey Andreevich Dotsenko; Nickolay Gennadievich Galkin; Alexander Samuilovich Gouralnik; Ludmila Valerievna Koval

doi:10.1380/ejssnt.2005.113

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In situ differential reflectance spectroscopy study of early stages of β-FeSi₂ silicide formation

Sergey Andreevich Dotsenko, Nickolay Gennadievich Galkin, Alexander Samuilovich Gouralnik, Ludmila Valerievna Koval

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Keywords: Film growth, Iron silicide, Differential Reflectance Spectroscopy, Atomic Force Microscopy, Si(111)

JOURNAL FREE ACCESS

2005 Volume 3 Pages 113-119

DOI https://doi.org/10.1380/ejssnt.2005.113

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Abstract

The methods of Differential Reflection Spectroscopy (DRS) and Atomic Force Microscopy (AFM) have been applied to study early stages of β-FeSi₂ silicide formation. Some details on the Dynamic Standard method in DRS are presented. The imaginary part of the dielectric function of the β-FeSi₂ film during its formation are calculated. [DOI: 10.1380/ejssnt.2005.113]

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