2006 Volume 4 Pages 534-538
Ultra-thin films of Cr2O3(0001) grown on Cr(110) were investigated by low-energy electron diffraction (LEED). Two samples with different oxide thicknesses were prepared. For the 5 nm-thick film, LEED revealed that the structure changes from 1×1 at 300 K to √3×√3 at 150 K and 1×1 at 100 K, which is in good agreement with a previous study. For the film thicker than 10 nm, LEED spot intensities were found to change with the sample temperature. LEED I-V curves shifted towards higher energy at 100 K compared to 300 K, which is attributed to a change of the mean inner potential. The origin of this change of the mean inner potential is discussed. [DOI: 10.1380/ejssnt.2006.534]
