Selective dewetting of polymers on metal/silicon micro-patterns

Olaf Karthaus; Takuto Terayama; Yuichi Hashimoto

doi:10.1380/ejssnt.2006.656

Regular Papers

Selective dewetting of polymers on metal/silicon micro-patterns

Olaf Karthaus, Takuto Terayama, Yuichi Hashimoto

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Keywords: Atomic force microscopy, Conductivity, Photoluminescence, Amorphous thin films, Metal-insulator interfaces, Nano-electronics and related devices, Polymers, Dewetting

JOURNAL FREE ACCESS

2006 Volume 4 Pages 656-660

DOI https://doi.org/10.1380/ejssnt.2006.656

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Abstract

Modification of electrode surfaces plays an important role for electronics. Most often, lithography techniques are used, but they suffer from high fabrication cost, material restrictions and size limitations. Here we investigate if dewetting can be used to selectively coat a micron-sized gold stripe electrode on a silicon substrate. [DOI: 10.1380/ejssnt.2006.656]

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