e-Journal of Surface Science and Nanotechnology
Online ISSN : 1348-0391
ISSN-L : 1348-0391
Regular Papers
Field Emission from W Tips Sharpened by Field-Assisted Nitrogen and Oxygen Etching
Jo OnodaFaridur RahmanSeigi Mizuno
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2008 Volume 6 Pages 152-156

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Abstract

Field emission properties were studied for tips sharpened using field-assisted nitrogen and oxygen etching. Sharp single crystal tungsten <111>-oriented tips were fabricated and evaluated by Fowler-Nordheim plots and field-ion microscopy observations. The results demonstrated emissions at lower bias voltages due to the sharpening of the tip apex using the etching. The field emission properties and tip shapes after nitrogen etching were compared with those obtained after oxygen etching. [DOI: 10.1380/ejssnt.2008.152]

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この記事はクリエイティブ・コモンズ [表示 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by/4.0/deed.ja
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