X-Ray Photoelectron Diffraction Study on the Surface and Interface Structure of VO2/TiO2(110) Model Catalyst

Shinya Miyasaka; Atsushi Suzuki; Masashi Nojima; Masanori Owari; Yoshimasa Nihei

doi:10.1380/ejssnt.2008.272

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X-Ray Photoelectron Diffraction Study on the Surface and Interface Structure of VO₂/TiO₂(110) Model Catalyst

Shinya Miyasaka, Atsushi Suzuki, Masashi Nojima, Masanori Owari, Yoshimasa Nihei

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Keywords: Photoelectron diffraction, X-ray photoelectron spectroscopy, Low energy electron diffraction, Titanium oxide, Vanadium oxide

JOURNAL FREE ACCESS

2008 Volume 6 Pages 272-275

DOI https://doi.org/10.1380/ejssnt.2008.272

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Abstract

We have studied the atomic structure of the surface and interface of VO₂/TiO₂(110) model catalyst by X-ray photoelectron diffraction (XPED). In this study, vanadium was deposited on the TiO₂(110) surface in the oxygen atmosphere. We characterized the VO₂ ultra-thin film grown on the TiO₂(110) surface by low energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS), and XPED. As a result, VO₂ ultra-thin film grown epitaxially on TiO₂(110) was determined by using the multiple scattering cluster model with spherical wave (MSC-SW). Finally, we carried out the quantitative analysis by using the reliability factor R (R-factor) method and clarified the surface and interface structures of VO₂/TiO₂(110). [DOI: 10.1380/ejssnt.2008.272]

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