IEICE Electronics Express
Online ISSN : 1349-2543
ISSN-L : 1349-2543
LETTER
Fabrication of metal nanoparticles as catalyst at low temperature and growth of silicon nanostructures
Minsung JeonYoshihiro TomitsukaKazuya MaishigiHisashi UchiyamaMinoru AoyagiKoichi Kamisako
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JOURNAL FREE ACCESS

2008 Volume 5 Issue 16 Pages 586-591

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Abstract

We firstly investigated the effect of hydrogen radical treatment to fabricate metal nanoparticles as catalyst, which is used for synthesizing one dimensional nanostructure, from metal oxide film at low temperature as 200°C. The metal nanoparticles with spherical shape were successfully fabricated after hydrogen radical treatment. Their surface shapes were clearly changed with increasing the hydrogen radical treatment time at same temperature. In addition, silicon nanostructures after fabrication of metal nanoparticles were grown at varied temperatures. The ball- and wire-like silicon nanostructures at 200°C and 400°C were synthesized, respectively. Their structure depends strongly on the growth temperature.

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© 2008 by The Institute of Electronics, Information and Communication Engineers
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