The soft magnetic properties of Fe(Si)/Fe(Si)O multilayered films were investigated. The films were prepared by the pulse-reactive sputtering (PRS) method, which enables multilayered films to be deposited as fast as single films. The soft magnetic properties of the as-prepared films were improved by adding Si. The films show B_s of 1.82-1.87 T and μ_i' of around 1000 at 300 MHz. A film with Bs of 1.82 T shows μ_i' of around 1000 at 350 MHz, even after patterning into 18.5 μm-wide stripes.