The diffusion coefficient of sulfur in the p(1×1) phase of a S/Ni(111) system has been measured in a temperature region from 486 K to 577 K by micro-probe Auger electron spectroscopy, in which the initial coverage profile of sulfur is prepared by depositing sulfur molecules in a localized circular area. The diffusion coefficient measured is in agreement with that reported in our previous paper, in which H₂S gas was used as a sulfur source and the initial coverage profile of sulfur was prepared by argon ion sputtering. It has been concluded that surface roughness of nickel, supposedly brought about by argon ion sputtering used in our previous work, does not exert appreciable influence upon the diffusion behavior of sulfur.