表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
特集 : 窒化物半導体表面の研究の現状
MBE成長窒化物半導体の表面構造
奥村 元沈 旭強井手 利英清水 三聡原 史朗園田 早紀清水 三郎
著者情報
ジャーナル フリー

2000 年 21 巻 3 号 p. 169-176

詳細
抄録

Surface reconstruction and their transition have been examined for MBE-grown GaN epitaxial layers. Several types of reconstruction were observed depending on the growth condition, crystal structure etc., and the reconstruction transitions were found to be related to effective III/V stoichiometry on the growing surface. It is shown that the surface reconstruction phase diagram and its phase transition line are useful for the optimization of MBE growth of GaN. Little amount of As4 residual pressure was found to affect the structure of GaN growing surfaces. These As surfactant effects are discussed and the growth of cubic GaN under small amount of As4 pressure is reported. The correspondence between the lattice polarity of hexagonal GaN epilayers and the surface reconstruction was confirmed by CAICISS technique. The quality of the epilayers which are grown so that the Ga-polarity is achieved is much improved.

著者関連情報

この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
前の記事 次の記事
feedback
Top