特集 : 単結晶基板の表面を比較する―誘電体から半導体, 金属まで―
完全エピタキシーを目指した金属酸化物基板の原子レベル表面制御
2000 年 21 巻 11 号 p. 702-709
詳細
2000 年 21 巻 11 号 p. 702-709
An overview of the current attention to the oxide epitaxy is given to emphasize the importance of atomic scale control of oxide substrate surfaces. Examples of the ways to define the surfaces are presented. A detailed study on SrTiO3 substrate surfaces, including surface dynamics during wet etching and high temperature annealing is presented in real space in order to show the state of the arts for regulation of oxide substrate surface towards perfect epitaxy of oxide heterostructures.
