2001 年 22 巻 3 号 p. 187-196
The principle of mechanochemical polishing and examples of the method are described. By using the method we can polish hard and functional materials with the abrasive powders that are mechanically softer than the materials. If the powders supplied are chemically reactive with the materials to be polished, mechanochemical reactions take place at the real contact points. Applications of this method to sapphire, silicon wafer, quartz and silicon carbide are shown.