2001 年 22 巻 4 号 p. 225-231
We have studied deposition of hydrogenated Si cluster ions, SinHx+ grown in an External Quadrupole Static attraction Ion Trap (EQSIT), on Si surfaces. The Si6H13+ and Si8H19+ ions, which have sp3 bonding networks, were grown stably in the EQSIT and subsequently deposited on the Si(111)-(7×7) surfaces with impact energy Ed = 6 and 12 ± 1 eV. The surface structures with the clusters were observed by Scanning Tunneling Microscopy (STM) and investigated in comparsion with the Si6H13+ and Si8H19+ structures calculated using the density functional theory. The STM observations indicated that the cluster ions adsorbed preferentially on the faulted half of the Si(111)-(7×7) unit cell. We observed that Si6H13+ is more resistant to fragmentation than Si8H19+ on impact to the surfaces. We consider that the difference is due to the structural difference of the clusters; Si6H13+ ions have a tightly connected ring structure while Si8H19+ ions have chain structures with several isomers.