表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
論文
Si(111)-(7×7)表面への水素化シリコンクラスターイオンの堆積
内田 紀行Leonid BOLOTOV渡辺 美代子宮崎 剛英金山 敏彦
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2001 年 22 巻 4 号 p. 225-231

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We have studied deposition of hydrogenated Si cluster ions, SinHx+ grown in an External Quadrupole Static attraction Ion Trap (EQSIT), on Si surfaces. The Si6H13+ and Si8H19+ ions, which have sp3 bonding networks, were grown stably in the EQSIT and subsequently deposited on the Si(111)-(7×7) surfaces with impact energy Ed = 6 and 12 ± 1 eV. The surface structures with the clusters were observed by Scanning Tunneling Microscopy (STM) and investigated in comparsion with the Si6H13+ and Si8H19+ structures calculated using the density functional theory. The STM observations indicated that the cluster ions adsorbed preferentially on the faulted half of the Si(111)-(7×7) unit cell. We observed that Si6H13+ is more resistant to fragmentation than Si8H19+ on impact to the surfaces. We consider that the difference is due to the structural difference of the clusters; Si6H13+ ions have a tightly connected ring structure while Si8H19+ ions have chain structures with several isomers.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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