表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
論文
接触角と質量分析によるクロム表面の光洗浄過程の追跡と汚染核成長機構の考察
三矢 宗久稲垣 嘉紀
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2001 年 22 巻 4 号 p. 232-237

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Photochemical cleaning processes of atmospherically contaminated chromium surfaces have been examined by contact angles of water and by time-of-flight secondary ion mass spectroscopy. Exposure of the contaminated surfaces, where contact angles are uniform, to vacuum-ultraviolet radiation results in characteristic distribution of contact angles before all the portions of the plate surface become hydrophilic. The unclean region which has larger contact angle as compared to the averaged value on the plate shows larger intensity of carbon-containing fragments in the spectrum. In order to explain the apparent discrepancy in these results, a model is proposed in which alternate lateral and normal growth of atmospheric clusters occurs on the chromium surface.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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