表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
小特集:ケルビンフォース法による表面電位測定技術の現状
超高真空SPMによる原子レベルの電位像観察
北村 真一鈴木 克之岩槻 正志
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2001 年 22 巻 5 号 p. 292-300

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The contact potential difference (CPD) imaging of Ag- and Au-deposited Si(111) 7×7 surfaces and the effect of CPD distribution on NC-AFM data are discussed. Scanning Kelvin probe force microscopy (SKPM) based on the measurement of electrostatic force gradient was applied under an ultrahigh vacuum (UHV) to acquire the data. The CPD images of Ag- and Au-deposited Si(111) 7×7 surfaces are virtually identical, irrespective of the deposited metals. Detailed analysis has revealed that the CPD images showing the atomically resolved potential difference, does not represent the intrinsic work function of the materials but reflects the local electron density on the surface. On the other hand, the average potential that corresponds to the DC level of the CPD image is considered to reflect the work function on the surface.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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