表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
特集:X線吸収微細構造(XAFS)による表面,界面の解析
XAFS測定の半導体への応用
大渕 博宣田渕 雅夫竹田 美和
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2002 年 23 巻 6 号 p. 367-373

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We demonstrated that fluorescence XAFS measurements can reveal the local structures around dilute elements in thin semiconductor layers. In the GaAs samples doped with Er and O, majority of the Er atoms substituted Ga sublattices with adjacent two O atoms and two As atoms (Er-2O center). In the GaInN/GaN samples, it was shown that the segregation of InN phase occurred in the GaInN layer at a higher In-content (x = 0.30), although the segregation was not observed at a lower In-content (x = 0.05). XANES spectrum in the Tb-implanted SiO2 sample was observed by detecting X-ray-excited visible luminescence. The spectrum was quite similar to that was measured by detecting fluorescence X-ray.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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