表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
特集:X線吸収微細構造(XAFS)による表面,界面の解析
透過電子エネルギー損失分光における内殻励起スペクトルを利用した軽元素材料の局所領域構造解析
武藤 俊介田辺 哲朗
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2002 年 23 巻 6 号 p. 381-388

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Analysis of core-loss spectra in electron energy-loss spectroscopy associated with transmission electron microscopy (TEM-EELS) is introduced as a tool giving information equivalent to X-ray absorption fine structure (XAFS) on nano-scale areas. After briefly describing the principle of TEM-EELS, including extended energy-loss fine structure (EX-ELFS) and energy-loss near edge structure (ELNES), merits and demerits of TEM-EELS are compared to those of XAFS analysis. A new analysis method applying the ‘wavelet transformation’ is introduced. This method is effective particularly to isolate the signals from the original EXELFS spectrum containing noises and artifacts. Furthermore, information on higher-order coordination shells and many-body correlations can be extracted from the EXELFS interference function, using the wavelet transformation. As an application example of this method, we show characterization of local structural relaxation of amorphous silicon by intense X-ray illumination. Finally some future prospects of TEM-EELS are briefly mentioned.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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