表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
論文
酸素プラズマ中での Si表面水素の挙動
篠原 正典片桐 輝昭岩辻 圭太郎松田 良信藤山 寛木村 康男庭野 道夫
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2004 年 25 巻 9 号 p. 541-547

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We investigate the behavior of surface hydrogen on hydrogen-terminated (100), (110) and (111) surfaces in oxygen plasma atmosphere by using infrared absorption spectroscopy (IRAS) in multiple internal reflection (MIR) geometry. We measured the infrared absorption spectra in Si-H stretching vibration region. IRAS data demonstrated that all of the hydride species on the Si(111) surface is abstracted by oxygen plasma, and, on the other hand, a large part of the hydride on the Si(100) and (110) surfaces are abstracted but some of them are left even after a long plasma-exposure. The surface hydrogen left after the plasma-exposure is considered to be due to the migration into subsurface region where oxygen species cannot reach. Therefore, we conclude that the abstraction of the surface hydrogen by oxygen plasma does not depend on the crystallographic orientations of Si surfaces, but the migration of surface hydrogen into the subsurface region depends on the crystallographic orientations.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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