A compact type angular-resolved secondary ion mass spectrometry was newly developed. The angular distribution (AD) of secondary ions ejected by oblique Ar⁺ sputtering at 62 degree from the normal to the surface was measured by a simple tilt operation of the sample stage under a special geometry of an ion gun, a sample stage and a detector. Using this system, AD of sputtered ions was measured for a HfN film sample. Ion intensities of Hf⁺, N⁺ and HfN⁺ decreased monotonously with an increase in the ejection angle. AD of Hf⁺ was identical with that of N⁺, implying that preferential sputtering attributed to the difference in mass and surface binding energy played a dominant role in Ar⁺ sputtering of HfN. Since the yield of HfN⁺ dimer ions was almost independent of that of Hf⁺ and N⁺ monomer ions, it was concluded that the HfN⁺ ions originated from a direct ejection process of clusters.