表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
論文
Ge/Si(105)表面の原子間力顕微鏡観察
秋山 琴音江口 豊明藤川 安仁安 東秀小野 雅紀橋本 保森川 良忠寺倉 清之櫻井 利夫Max G. LAGALLY長谷川 幸雄
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2005 年 26 巻 8 号 p. 486-491

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We have investigated the atomic structure and electrostatic potential distribution of Ge(105)-(1×2) surfaces formed on Si(105) substrates by high-resolution atomic force microscopy (AFM) with Kelvin probe method. By detecting the force between the tip and samples, AFM makes images without being affected by the electronic states unlike scanning tunneling microscopy (STM). In our AFM study, we have succeeded in visualizing all eight atoms having a dangling bond in the (1×2) unit cell, which were not resolved with STM. The atomic positions are consistent with a structural model called rebonded step model, which was predicted in a previous study with STM and first principles calculation. Furthermore, we have directly observed charge transfer between dangling bond states of the surface atoms by measuring the electrostatic potential in atomic resolution using Kelvin probe method. These results demonstrate that atomically resolved non-contact AFM is an ideal tool for analysis of atomic structures and electronic properties of the surfaces.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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