We have proposed herein a novel microfabrication method for polymer ultrathin films that utilizes fluoroalkylsilane monolayer patterned substrates and ink-jet technology. The purpose of this study is to establish the fundamental methods for site-selective formation of polymer thin film utilizing wetting contrast of patterned fluoroalkylsilane monolayer (Rf)/si-lanol (Si-OH) surfaces. Rf/Si-OH patterned surface prepared by the VUV-rays lithography have lyophobic Rf and lyophilic Si-OH phases, respectively. Polystyrene/xylene solution was used to coat the patterned surface with wetting contrast by the ink-jet method. The patterned polystyrene ultrathin films were selectively formed on lyophilic areas.
