表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
特集:有機半導体デバイスと表面・界面:デバイス技術と物性評価法の進展
Backside SIMSによる有機EL素子界面の不純物拡散評価
宮本 隆志藤山 紀之
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2007 年 28 巻 5 号 p. 249-252

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Although changes in the layer structure of an OLED as well as the diffusion phenomena in cathode materials and in EIM (electron-injection material) have been discussed actively, fundamental questions have remained unanswered. Using backside SIMS technique after optimised preprocessing of OLED samples, it has been possible to measure more accurate profiles of diffused elements, which was quite difficult under conventional SIMS analysis from the front surface due to so called knock-on effect. We have utilized the backside SIMS in the deterioration evaluation of OLED devices under the high temperature storage condition. Diffusion of EIM has been found with the change in layer structure depending on Tg (glass transition temperature) of HTM (hole transport material). On the basis of the analysis, it was found that the diffusion of EIM and the change in the layer structure depended on the Tg (glass transition temperature) of the HTM (hole-transport material) at the deterioration evaluation during high-temperature storage.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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