表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
特集:有機半導体デバイスと表面・界面:デバイス技術と物性評価法の進展
周波数変調型ケルビンプローブ原子間力顕微鏡による有機薄膜評価
山田 啓文
著者情報
ジャーナル フリー

2007 年 28 巻 5 号 p. 253-263

詳細
抄録

Kelvin probe force microscopy (KFM), which has been a common method for studying electrical properties of nanometer-scale structures, is a dynamic-mode atomic force microscopy (AFM) technique combined with a traditional Kelvin probe method used for measuring macroscopic contact potential differences. It allows us to map electron affinity or work function on a nanometer scale. In this article KFM using a frequency modulation detection method (FM-KFM) is first explained briefly. The frequency modulation method plays an essential role in high-sensitive interaction force detection. We also describe applications of FM-KFM to the nanometer-scale surface potential investigations of organic materials including phase-separated self-assembled monolayer films (PS-SAM films) and single polymer crystal surfaces. Furthermore, recent results on the local surface potential study of carbon nanotube field effect transistors using FM-KFM is presented.

著者関連情報

この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
前の記事 次の記事
feedback
Top