表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
特集:化合物半導体ナノ作製技術の新展開
III-V族化合物半導体表面のMBE成長その場STM観察
塚本 史郎
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ジャーナル フリー

2008 年 29 巻 12 号 p. 758-764

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High density arrays of quantum dots (QDs) can easily be grown by ‘self-assembled’ methods. However, the precise mechanism of ‘self-assembled’ is not well understood, which hampers the control over QD size, density and distribution for particular applications. Therefore, in-situ evaluation technique for observing the growth process is necessary and indispensable. STM is a good technique to observe the surface in atomic level but it prevents vibrations and material depositions. So, usually its observation is made after transporting the sample from MBE growth chamber to the STM through a gate valve, resulting that the temperature of the sample is returned to room temperature. Since the real in-situ observation cannot be done with this ordinary method, we develop “STMBE” system in which the STM is placed completely inside MBE growth chamber, and with this system, the surface structure is analyzed centering on the in-situ STM observation of the InAs QD self-assemble process on GaAs(001).

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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