There are a lot of demands for the semiconductor manufacturing process of large-scale integrated circuit(LSI) and LSI package. Especially, low temperature processes for surface cleaning are strongly required. In this paper, we introduce a novel cleaning technology of various metals using atomic hydrogen generated by a heated catalyzer, hot wire (HW) method. In the case of solder bump cleaning in semiconductor packaging, the oxide layer on the Sn surface was completed reduced, and it was confirmed the effectiveness in improving the flip-chip bonding by the atomic hydrogen treatment. In the case of Cu nano ink-jet wiring, the resistivity was drastically decreased by the atomic hydrogen treatment.