表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
研究紹介
ラボ用硬X線光電子分光装置の開発
小畠 雅明岩井 秀夫Igor Píš吉川 英樹田沼 繁夫田中 彰博鈴木 峰晴小林 啓介
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2010 年 31 巻 9 号 p. 487-492

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A hard X-ray photoelectron spectroscopy (HXPS) instrument has been developed for laboratory use by combining a monochromatic Cr Kα focused X-ray source, a wide acceptance angle objective lens and a high energy electron analyzer. The Cr Kα X-rays excited by a micro focused electron beam at 20 kV beam voltage are diffracted by an ellipsoidal bent crystal monochromator and focused on the sample. A wide acceptance angle objective lens was integrated as the first section of an input lens of a hemispherical analyzer. A 9.9 μm diameter minimum X-ray spot size was achieved and the energy resolution of 0.56 eV was obtained by Au Fermi edge measurements. The maximum acceptance angle and angular resolution were 70o and 0.54o, respectively. The typical acquisition time is about 30 min for a wide energy survey spectrum and about 1 h for Si 1s angle resolved spectra obtained without tilting the sample. The application of this instrument for the analyses of overlayers and multilayer thin films is also discussed.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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