2010 年 31 巻 11 号 p. 587-592
We applied B18HX+ as an alternation of B+ or BF2+ to the implantation for source-drain extension in pMOSFETs corresponding to 65 nm and 28 nm technology nodes. We could obtain identical or better characteristics compared to the cases of conventional ions. In addition, we found from blank wafer that larger impact damage to Si atoms in B18HX+ implantation leads to more advantageous Rs−Xj in activation processing with only millisecond annealing.