表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
特集:新ヘテロ界面の実現に向けた半導体結晶成長技術の進展
ダイヤモンド/窒化物半導体ヘテロ構造の結晶成長と物性
平間 一行谷保 芳孝嘉数 誠
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2010 年 31 巻 12 号 p. 657-666

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Diamond/III-V nitride semiconductor heterostructure appears promising not only for high-efficiency deep-UV light emitting diodes (LEDs) but also for high output power field-effect transistors (FETs). However, diamond has a diamond crystal structure, while III-V nitride semiconductors have a wurtzite crystal structure. Due to the deference in the crystal structures, single-crystal III-V nitride growth on diamond substrate was difficult. In this study, we obtained the single-crystal aluminum nitride (AlN) (0001) layers on diamond substrates by using (111) diamond surface orientation and preventing the formation of the interface layer. Then, we revealed the heteroepitaxial growth mechanism and proposed an atomic arrangement model at the diamond/AlN heterointerface. Furthermore, we demonstrated a p-type diamond/n-type AlN heterojunction diode and successfully observed band-edge emission from diamond. In addition, an AlGaN/GaN heterostructure with two-dimensional electron gas (2DEG) was grown on diamond (111) using the single-crystal AlN buffer layer.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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