2010 年 31 巻 2 号 p. 81-87
Synchrotron radiation surface research has shown drastic progress in these twenty years mainly owing to higher brilliance of synchrotron radiation sources and higher sensitivity and/or resolution of detectors. We have developed an in situ analysis system combined with a thin film growth chamber for advance device applications, and have used this system as a nano-space laboratory for analyzing surface/interface electronic structures.