MATERIALS TRANSACTIONS
Online ISSN : 1347-5320
Print ISSN : 1345-9678
ISSN-L : 1345-9678
X-ray Fluorescence Holography Study on Si1−xGex Single Crystal
Kouichi HayashiYukio TakahashiIchiro YonenagaEiichiro Matsubara
Author information
JOURNAL FREE ACCESS

2004 Volume 45 Issue 7 Pages 1994-1997

Details
Abstract

We measured the X-ray fluorescence holograms of Si0.999Ge0.001, Si0.8Ge0.2, Si0.5Ge0.5, Si0.2Ge0.8 and Ge single crystals, and reconstructed the images of second neighbor atoms around Ge. The positional shift of the atomic image across the whole composition range was three times larger than the value predicted from the difference in the lattice constants of pure Si and Ge. We found that imaginary part of the reconstruction strongly affects the positions of the atomic images. Thus, using the negative real parts, the atomic image became sharp and its shift dependent upon Ge composition comes to the reasonable values.

Content from these authors
© 2004 The Japan Institute of Metals and Materials
Previous article Next article
feedback
Top