Study on Fabrication of Titanium Oxide Films by Oxygen Pressure Controlled Pulsed Laser Deposition

Takahiro Nakamura; Eiichiro Matsubara; Nobuaki Sato; Atsushi Muramatsu; Hideyuki Takahashi

doi:10.2320/matertrans.45.2068

Takahiro Nakamura, Eiichiro Matsubara, Nobuaki Sato, Atsushi Muramatsu, Hideyuki Takahashi

Author information

Keywords: titanium oxide, thin film, pulsed laser deposition (PLD), grazing incidence X-ray scattering (GIXS), X-ray reflection

JOURNAL FREE ACCESS

2004 Volume 45 Issue 7 Pages 2068-2072

DOI https://doi.org/10.2320/matertrans.45.2068

Details

Abstract

Titanium oxide films were formed using a titanium target by a pulsed laser deposition (PLD) technique under different oxygen pressures from 10⁻⁶ to 100 Pa. Their densities and thickness were evaluated from total external X-ray reflection profiles and their atomic structures were determined by grazing incidence X-ray scattering (GIXS), and their surface morphology was observed by atomic force microscopy (AFM). The atomic structures of the films were gradually changed from metal titanium through TiO to Rutile-type titanium dioxide TiO₂. The film surfaces became rough above 13.3 Pa oxygen pressure during deposition. Their UV transmission spectroscopy was also observed to predict their photocatalytic activities.

Corresponding author

Register with J-STAGE for free!