Thick (8 μm) Al-Si films both on poly Si (0.5 μm thick)/SiO₂/Si and SiO₂/Si substrates were subjected to cyclic current application or cyclic heating and cooling. Both the cyclic current application and the cyclic heating and cooling led to specimen surface roughening. The average roughness increased with the number of cycles, but the extent of roughness for the former was much larger than that for the latter. These results correspond to the fact that grain size and texture for the latter are two times larger and more [111] oriented than those for the former, respectively. According to Electron Back Scattering Pattern (EBSP) measurements, grains with an orientation deviating from [111] were found to deform heavily during the cyclic current charging or heating, resulting in grain extrusion on the surface.