FIB Induced Damage Examined with the Low Energy SEM

Šárka Mikmeková; Kenji Matsuda; Katsumi Watanabe; Susumu Ikeno; Ilona Müllerová; Ludek Frank

doi:10.2320/matertrans.MB201005

Šárka Mikmeková, Kenji Matsuda, Katsumi Watanabe, Susumu Ikeno, Ilona Müllerová, Ludek Frank

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Keywords: scanning low energy electron microscopy, focused ion beam, beam induced damage, sputtering

JOURNAL FREE ACCESS

2011 Volume 52 Issue 3 Pages 292-296

DOI https://doi.org/10.2320/matertrans.MB201005

View "Advance Publication" version (December 22, 2010).

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Abstract

The surface morphology of pure Mg was studied by means of the cathode lens mode equipped scanning low energy electron microscope after bombarding with Ga⁺ ions at various energies (10, 20, 30, and 40 keV) and incident angles (0°, 30°, 45°, and 60°). In accordance with the Bradley-Harper theory at off-normal angles of incidence ripples were observed on the irradiated areas. The Monte Carlo program SRIM2008 was used to estimate the sputtering yield and damage depth.

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