Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Directed Self-assembly on Sparse Chemical Patterns for Lithographic Applications
Joy Y. Cheng, Alshaki Nelson, Charles T. Rettner, Daniel P. Sanders, Alexander Sutherland, Jed W. Pitera, Young-Hye Na, Ho-Cheol Kim, William Hinsberg
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Keywords: directed self-assembly, block copolymers, resolution enhancement, self-healing, scalability
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2009 Volume 22 Issue 2 Pages 219-222

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© 2009 The Society of Photopolymer Science and Technology (SPST)
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