Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
The Photopolymer Science and Technology Award
Dario L. Goldfarb, Libor Vylicky, Sean D. Burns, Karen Petrillo, John Arnold, Anthony Lisi, Dirk Pfeiffer, Daniel P. Sanders, Robert D. Allen, David R. Medeiros, Dah chung Owe-Yang, Kazumi Noda, Seiichiro Tachibana, Shozo Shirai
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Keywords: Award
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2009 Volume 22 Issue 1 Pages 7-11

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Abstract

The Photopolymer Science and Technology Award No. 092100, the Best Paper Award 2009, was presented to Dario L. Goldfarba, Libor Vyklickya, Sean D. Burnsa, Karen Petrillob, John Arnoldb, Anthony Lisib, Dirk Pfeiffera, Daniel P. Sandersc, Robert D. Allenc, David R. Medeirosb, Dah Chung Owe-Yangd, Kazumi Nodae, Seiichiro Tachibanae, and Shozo Shiraie (aIBM T.J. Watson Research Center, bIBM Systems & Technology Group, cIBM Almaden Research Center, dShin-Etsu MicroSi, Inc., eShin-Etsu Chemical Co.) for their outstanding contribution published in the Journal of Photopolymer Science and Technology, 21(3), 397-404 (2008), entitled "Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography".

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© 2009 The Society of Photopolymer Science and Technology (SPST)
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