表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
非負拘束付き最小二乗法を用いたスペクトル合成法によるGaAs/AlAs膜のオージェデプスプロファイルの解析
荻原 俊弥田沼 繁夫
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1992 年 13 巻 10 号 p. 606-611

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We have carried out the Auger depth profiling analysis of GaAs/AlAs multilayer structure using the peaks of GaMVV and A1LVV. Since the two peaks of the specimen overlapped each other, we made peak separation with peak synthesis technique using a non-negative least-square curve fit containing a peak-shift correction. The top-hat filtered spectra were used for the calculation to remove their background. This procedure gave excellent results for the peak separation especially for the sample which had a large difference in elemental concentration.

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