Hyomen Kagaku
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
Evaluation of Semiconductor Surfaces by Radioluminography
Hisashi MURAOKASadami SHIBABETadashi NOZAKIKatsuya OKUMURA
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1993 Volume 14 Issue 5 Pages 288-294

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Abstract

Radioluminography is a new type autoradiography, in which a radioactivity distribution pattern is recorded in a photo-stimurable phosphor layer of an imaging plate, then converted, on a reading unit, to digitalized image data storable in a disk, and finally visualized and quantitatively analyzed by using an analyzing unit. This method was applied to the evaluations of 59Fe and 64Cu adsorption on Si wafer surface and of SC-1 (NH4OH : H2O2 : H2O=1 vol : 1 vol : 5 vol) cleaning efficiency against these adsorbed impurities. The distributions of the adsorbed radioisotopes before and after the cleaning were manifested to be understood at a glance. It was found that radioisotope density in any area at any position on the wafer could be determined with the detection limit of the order of 108 atoms/cm2 and the dynamic range over the order of 104.

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© The Surface Science Society of Japan
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