Generally a multi layer films have been prepared by dry process, for example evaporation method and spattering method. In this paper, the preparation method of multi layer film by plating method which is typical wet process is discussed. There are three types of the preparation method which is single cell method, dual cell method, and flow solution method. And especially, in this paper, some photographs of the cross sectional structure of the multi layer film prepared by the plating method are shown. I think that it seems to be possible to make the multi layer film below some nm in each thickness. The plating method is cheaper process to make a metal film, and so previously they are expected to make some functional film.