1994 年 15 巻 5 号 p. 316-322
Two prototype inner-magnet type micro-sputtering apparatus, named “KA-Jr.” and “HAMSA” by the authors, have been constructed. The concept of this inner-magnet type apparatus is quite different from that of the conventional sputtering apparatus into which substrates must be inserted. These new apparatus are suitable to make deposition or etching on any area of the substrate that is too large to insert into the vacuum chamber or on biological materials. The “KA-Jr.” can be applied to repair a damaged part of a thin film coated on a large window glass or defects of electrode lines formed on a photo mask or a liquid crystal panel by selecting either deposition or etching mode by chanin the anode position in this apparatus. On the other hand, “HAMSA” is very small and easy to handle. Therefore it is useful for forming dental caries preventing films on teeth in vivo and in making micro-marking on curved surfaces of shells and fishes.