In our previous paper on Takeoff Angle-Dependent X-Ray Fluorescence (TAD-XRF) method, the dependence of fluorescent X-ray intensity on the takeoff angle is measured, and it is also shown that the characterization of thin films is possible by using the method. In this paper, we present a newly developed analytical method, Glancing-Incidence and -Takeoff X-Ray Fluorescence (GIT-XRF) method, to measure the TAD-XRF curves at various incident angles of the primary X-ray. Compared with conventional total reflection X-ray fluorescence methods, GIT-XRF has unique advantages: (1) The observation depth for the fluorescent X-rays is restricted by both the incident and takeoff angles. Therefore, when the incident angle and the takeoff angle are set to below the critical angle for total reflection, the observation depth becomes extremely small, and a surfacesensitive analysis is achieved. (2) In GIT-XRF, the TAD-XRF curves are measured at various incident angles, and thus the thin film is cross-checked with many experimental curves, and moredetailed analysis of the thin film has been possible. In this paper, the GIT-XRF of Mn/Au double-layers is reported, and the characteristics of the GIT-XRF method for the surface and thin-film analysis are shown.