Ultrathin stoichiometric PbTiO3 films, 10∼100nm thick, were deposited on (001)SrTiO3 and miscut (001)SrTiO3 substrates at 600°C by rf planar magnetron sputtering to understand the microstructure of initial film growth. The electron microscopy and X-ray diffraction analysis suggested the epitaxial growth of (001)PbTiO3/(001)SrTiO3 with three dimensional crystal orientation, however the PbTiO3 films still included crystal boundaries. Deposition on a miscut (001)SrTiO3 substrate under stoichiometric conditions reduced the crystal boundaries and provided continuous ultrathin films of single crystal PbTiO3.
