Adsorbed Amphipathic Molecule Layer on Solid-liquid Interface Studied by Surface Force Measurement with AFM

Tsutomu KAN-NO; Masatoshi FUJII; Kazuhiro FUKADA; Tadashi KATO; Tsutomu SEIMIYA

doi:10.1380/jsssj.17.423

両親媒性分子の固液界面への吸着挙動

AFMを用いた表面間力測定法

菅野勉, 藤井政俊, 深田和宏, 加藤直, 清宮懋

著者情報

ジャーナルフリー

1996 年 17 巻 7 号 p. 423-425

DOI https://doi.org/10.1380/jsssj.17.423

詳細

発行日: 1996/07/10 受付日: 1996/02/21 J-STAGE公開日: 2009/08/07 受理日: 1996/04/10 早期公開日: - 改訂日: -
訂正情報
訂正日: 2009/08/07 訂正理由: - 訂正箇所: 論文抄録訂正内容: Wrong : The interaction between a planar SiO₂ surface and a Si₃N₄ probe of AFM was measured in aqueous solutions of cationic surfactant homologues CH₃(CH₂)_n-1 N(CH₃)₃Br (n=12&sim;18). The potential profiles changed with the surfactant concentrations. In the high concentration region, the mechanical strength of the adsorbed layer was examined by applying an excess pressure from the probe.
Right : The interaction between a planar SiO₂ surface and a Si₃N₄ probe of AFM was measured in aqueous solutions of cationic surfactant homologues CH₃(CH₂)_n-1 N(CH₃)₃Br (n=12∼18). The potential profiles changed with the surfactant concentrations. In the high concentration region, the mechanical strength of the adsorbed layer was examined by applying an excess pressure from the probe.

訂正日: 2009/08/07 訂正理由: - 訂正箇所: 引用文献情報訂正内容: Wrong : 1) G. Binnig, C.F. Quate and Ch. Gerber: Phys. Rev. Lett. 56, 930 (1986).
2) W.A. Ducker, T.J. Senden and R.M. Pashley: Nature 353, 239 (1991).
3) Y.Q. Li, N.J. Tao, J. Pan, A.A. Garcia and S.M. Lindsay: Langmuir 9, 637 (1993).
4) Y.I. Rabinovich and R.-H. Yoon: Langmuir 10, 1903 (1994).
5) M.W. Rutland and J.L. Parker: Langmuir 10, 1110 (1994).
6) T.J. Senden and C.J. Drummond: Colloids Surfaces A94, 29 (1995).
7) A.L. Weisenhom, P. Maivald, H.-J. Butt and P.K. Hansma: Phys. Rev. B45,11226 (1992).
8) J.F. Scamehorn, R.S. Schechter and W.H. Wade: J. Colloid Interface Sci. 85, 463 (1982).
9) P. Wängnerud and B. Jönnson: Langmuir 10, 3268 (1994).
10) S.B. Johnson, C.J. Drummond, P.J. Scales and S. Nishimura: Colloids Surfaces A103, 195 (1995).
11) J.N. Israelachvili: “Intermolecular & Surface, Forces” (Academic Press, London, 1991).

Right : 1) G. Binnig, C.F. Quate and Ch. Gerber: Phys. Rev. Lett. 56, 930 (1986).
2) W.A. Ducker, T.J. Senden and R.M. Pashley: Nature 353, 239 (1991).
3) Y.Q. Li, N.J. Tao, J. Pan, A.A. Garcia and S.M. Lindsay: Langmuir 9, 637 (1993).
4) Y.I. Rabinovich and R.-H. Yoon: Langmuir 10, 1903 (1994).
5) M.W. Rutland and J.L. Parker: Langmuir 10, 1110 (1994).
6) T.J. Senden and C.J. Drummond: Colloids Surfaces A94, 29 (1995).
7) A.L. Weisenhom, P. Maivald, H.-J. Butt and P.K. Hansma: Phys. Rev. B45,11226 (1992).
8) J.F. Scamehorn, R.S. Schechter and W.H. Wade: J. Colloid Interface Sci. 85, 463 (1982).
9) P. Wängnerud and B. Jönnson: Langmuir 10, 3268 (1994).
10) S.B. Johnson, C.J. Drummond, P.J. Scales and S. Nishimura: Colloids Surfaces A103, 195 (1995).
11) J.N. Israelachvili: “Intermolecular & Surface, Forces” (Academic Press, London, 1991).

抄録

The interaction between a planar SiO₂ surface and a Si₃N₄ probe of AFM was measured in aqueous solutions of cationic surfactant homologues CH₃(CH₂)_n-1 N(CH₃)₃Br (n=12∼18). The potential profiles changed with the surfactant concentrations. In the high concentration region, the mechanical strength of the adsorbed layer was examined by applying an excess pressure from the probe.

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