Scanning probe microscope (SPM) has increasingly attracted attention lately as powerful nanotechnology tools for observation of surface morphology, measurements of tip-surface interaction, manipulations of atoms and lithography in nanoscale. Micromachining is one key technology to generate a new silicon based probe for SPM. In order to measure the small force, microfabricated cantilever with a low spring constant is required. On the other hand high resonant frequency is required to reduce external noise and to obtain a high scan-rate. Scaling-law shows that small-sized cantilever has a low spring constant and a high resonant frequency. By etching a bulk silicon under control, extremely thin single-crystalline cantilever can be fabricated. When the motion of thin beam structure is sensed capacitively, narrowing a gap between thin cantilever and electrode is one of the most effective methods to raise the sensitivity. Therefore, a thin silicon beam having an opposed electrode with a narrow gap was fabricated for capacitive AFM probe. At the tip of cantilever, silicon-tip can be fabricated by depositing silicon atoms owing to field evaporation using ultra-high-vacuum scanning tunneling microscope.