表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
脱溶存酸素・超純水によるGaAs(001)表面の洗浄および洗浄表面に対する熱処理の効果
廣田 幸弘渡辺 義夫福田 常男住友 弘二荻野 俊郎
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1997 年 18 巻 4 号 p. 232-239

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We present recent results of synchrotron radiation photoelectron spectroscopy, ultra-violet photoelectron spectroscopy, low energy electron diffraction, scanning tunneling microscopy, and photoluminescence measurements for the horizontal Bridgman-grown GaAs(001) surface prepared by the deoxygenated and deionized water (DODIW) treatment. We discuss the relationship between surface stoichiometry, surface structure, and the pinning position of surface Fermi level for the DODIW-treated GaAs(001) surface, and point out that the position of surface Fermi level is strongly affected by crystal defects near the surface.

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© 社団法人 日本表面科学会
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