1997 年 18 巻 5 号 p. 262-268
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Recently, advances in the technological development of ion sources and ion acceleration, the use of eV to GeV atomic, molecular and cluster ions has become possible in materials research for deposition, surface modification, new materials formation, surface analysis, etc. Among the ion beam techniques, ion implantation is a unique method for altering the surface properties of materials. Here, some studies on ion implantation with ceramic materials are reviewed in short. Some recent studies on ion implantation with metals and rare earth elements for optical and optoelectronic applications are also shown.