表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
TOF-SIMS, Q-SIMS, XPSによるイオン照射に伴う有機材料表面の状態変化の解析
西原 孝義一戸 裕司工藤 正博星 孝弘遠藤 一央
著者情報
ジャーナル フリー

1997 年 18 巻 6 号 p. 362-366

詳細
抄録

Damages caused by ion beam irradiation during S-SIMS measurements of polymer samples such as polytetrafiuoroethylene (TEFLON), polyethyleneterephthalate (PET) and polycaprolactam (NYLON6) were investigated by using TOF-SIMS, QSIMS and XPS. Intensity changes of each secondary ion species vs. ion dosage were analyzed from the view point of chemical structures of the samples. Changes of surface chemical structures due to ion bombardments were also investigated via curve fitting and quantification of the observed XPS spectra. The results were discussed with the aid of semiempirical MO calculations, which proved to be useful for the qualitative interpretation of the chemical state change analyzed by XPS and the origin of the major peaks in the S-SIMS spectra.

著者関連情報
© 社団法人 日本表面科学会
前の記事 次の記事
feedback
Top