表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
ミスカットSrTiO3基板上のPbTiO3スパッタ薄膜の構造と薄膜成長機構
ミスカット角度の薄膜構造への影響
羽根田 陽子和佐 清孝足立 秀明神野 伊策
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1998 年 19 巻 7 号 p. 463-468

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Thin films of PbTiO3 (PT) were grown on various miscut (001) SrTiO3 (ST) substrates at 600°C by rf planar magnetron sputtering. The films on ST (miscut angle≤0.9°) included grain boundaries, but on ST (miscut angle≥1.7°) the surfaces were extremely smooth and comprised a periodic striped pattern which reflected the initial surface structure of the substrates. It was found that the critical miscut angle of substrate where the growth mode changes from twodimensional nucleation to step-flow was between 0.9°and 1.7°. TEM and XRD analysis showed that the PT thin films on miscut ST (miscut angle>≥1.7°) showed continuous single c-domain single crystal structure with three-dimensional epitaxy. The analysis of the c-axis tilt of the PT thin films also revealed that the film growth was governed by the stepflow growth.

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