表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
金属/シリコン初期界面の水素誘起自己組織化
片山 光浩柳 正鐸久保 理Alexander A. SARANINAndrey V. ZOTOV尾浦 憲治郎
著者情報
ジャーナル フリー

1998 年 19 巻 9 号 p. 579-587

詳細
抄録

Recently, several works have been reported concerning the adsorption of atomic hydrogen (H) on metal (e. g. Ag)-induced Si(111)√3×√3 surface phases, in which the displacive adsorption of H causes the formation of metal clusters with nanometer size. These phenomena have disclosed an interesting process of self-organization from 2 D metal layer into 3 D clusters induced by adsorption of H. However, as for the interaction of H with other surface reconstructions besides √3×√3, only a few studies have been reported. Since the H-induced structural rearrangement of metal/Si surface phases is thought to be dependent on their original surface structures, it is possible for an appropriate surface phase to be self-organized into peculiar structures in a different manner than the above-mentioned 2 D-3 D transformation using the interaction of H. In this paper, we will show interesting behaviors of metal atoms and substrate Si atoms against H adsorption on metal/Si surfaces besides √3×√3, using the Si(100)2×1-Sb and the In/Si(111) surface phases as examples.

著者関連情報
© 社団法人 日本表面科学会
前の記事 次の記事
feedback
Top