Structure and Growth Mechanism of Porous Anodic Oxide Films Anodizing of Aluminum and Magnesium

Sachiko ONO

doi:10.1380/jsssj.19.790

アノード酸化により生成する多孔質皮膜の構造と成長機構

アルミニウムおよびマグネシウムについて

小野幸子

著者情報

ジャーナルフリー

1998 年 19 巻 12 号 p. 790-798

DOI https://doi.org/10.1380/jsssj.19.790

詳細

発行日: 1998/12/10 受付日: - J-STAGE公開日: 2009/08/07 受理日: - 早期公開日: - 改訂日: -
訂正情報
訂正日: 2009/08/07 訂正理由: - 訂正箇所: 引用文献情報訂正内容: Wrong : 6) J.P. O'Sullivan and G.C. Wood: Proc. Roy. Soc. London, A 317, 511 (1970).
7) J.W. Diggle, T.C. Downie and C.W. Golding: J. Electrochem. Soc. 116, 737 (1969).
11) T.P. Hoar and J.Yahalom: J. Electrochem. Soc. 110, 614 (1963).
12) F. Keller, M.S. Hunter and D.L. Robinson: J. Electro-chem. Soc. 100, 411(1953).
15) M. Saito, Y. Shiga, M. Miyagi, K. Wada and S. Ono: Jpn. J. Appl. Phys. 34, 3134 (1995).
18) S. Ono and N. Masuko: 45th Ann. Meeting of Intern. Soc. Electrochemistry, Abstracts Vol. 2, VII-83 (Portugal, 1994).
20) A. Güntherschultze and H. Betz: Z. Phys. 92, 367 (1934).
21) A. Charlesby: Proc. Phys. Soc. B 66, 317 (1953).
22) N.F. Mott: Trans. Faraday Soc. 43, 429 (1947).
23) J.W. Diggle, T.C. Downie and C.W. Goulding: Chemical Reviews 69, 365 (1969).
24) C.J. Dell'oca and P.J. Fleming: J. Electrochem. Soc. 123, 1487 (1976).
25) G.C. Wood, P. Skeldon, G.E. Thompson and K. Skeldon: J. Electrochem. Soc. 143, 74 (1996).
26) P. Skeldon, K. Shimizu, G.E. Thompson and G.C. Wood: Thin Solid Films 123,127 (1985).
27) S. Ono and N. Masuko: Corros. Sci. 33, 503 (1992).
29) Y. Fukuda and T. Fukusima: Bull. Chem. Soc. Jpn 53, 3125 (1980).
30) G.E. Thompson, R.C. Furneaux and G.C. Wood: Corros. Sci.18, 481(1978).
34) R.B. Mason: J. Electrochem. Soc. 102, 671 (1955).
35) F. Liechti and W.D. Treadwell: Helv. Acta 30, 1204 (1947).
36) S. Ono, H. Ichinose and N. Masuko: J. Electrochem. Soc. 138, 3705 (1991).
41) S. Ono, H. Ichinose and N. Masuko: J. Electrochem. Soc. 139, L 80 (1992).
45) S. Tajima, M. Soda, T. Mori and N. Baba: Electrochim. Acta 1, 205 (1959).
48) M. Masuda and K. Fukuda: Science 268, 1466 (1995).
49) H. Masuda, F. Hasegawa and S. Ono: J. Electrochem. Soc. 144, L 127 (1997).
50) H. Masuda, H. Yamada, M. Saitoh, H. Asoh, M. Nakao and T. Tamamura: Appl. Phys. Lett. 71, 2770 (1997).
51) E.F. Emely: “Principle of Magnesium Technology” (Pergamon Press, New York, 1966).
56) S. Ono, K. Asami, T. Osaka and N. Masuko: J. Electrochem. Soc. 143, L 62(1996).

Right : 6) J.P. O'Sullivan and G.C. Wood: Proc. Roy. Soc. London, A 317, 511 (1970).
7) J.W. Diggle, T.C. Downie and C.W. Golding: J. Electrochem. Soc. 116, 737 (1969).
11) T.P. Hoar and J.Yahalom: J. Electrochem. Soc. 110, 614 (1963).
12) F. Keller, M.S. Hunter and D.L. Robinson: J. Electro-chem. Soc. 100, 411(1953).
15) M. Saito, Y. Shiga, M. Miyagi, K. Wada and S. Ono: Jpn. J. Appl. Phys. 34, 3134 (1995).
18) S. Ono and N. Masuko: 45th Ann. Meeting of Intern. Soc. Electrochemistry, Abstracts Vol. 2, VII-83 (Portugal, 1994).
20) A. Güntherschultze and H. Betz: Z. Phys. 92, 367 (1934).
21) A. Charlesby: Proc. Phys. Soc. B 66, 317 (1953).
22) N.F. Mott: Trans. Faraday Soc. 43, 429 (1947).
23) J.W. Diggle, T.C. Downie and C.W. Goulding: Chemical Reviews 69, 365 (1969).
24) C.J. Dell'oca and P.J. Fleming: J. Electrochem. Soc. 123, 1487 (1976).
25) G.C. Wood, P. Skeldon, G.E. Thompson and K. Skeldon: J. Electrochem. Soc. 143, 74 (1996).
26) P. Skeldon, K. Shimizu, G.E. Thompson and G.C. Wood: Thin Solid Films 123,127 (1985).
27) S. Ono and N. Masuko: Corros. Sci. 33, 503 (1992).
29) Y. Fukuda and T. Fukusima: Bull. Chem. Soc. Jpn 53, 3125 (1980).
30) G.E. Thompson, R.C. Furneaux and G.C. Wood: Corros. Sci.18, 481(1978).
34) R.B. Mason: J. Electrochem. Soc. 102, 671 (1955).
35) F. Liechti and W.D. Treadwell: Helv. Acta 30, 1204 (1947).
36) S. Ono, H. Ichinose and N. Masuko: J. Electrochem. Soc. 138, 3705 (1991).
41) S. Ono, H. Ichinose and N. Masuko: J. Electrochem. Soc. 139, L 80 (1992).
45) S. Tajima, M. Soda, T. Mori and N. Baba: Electrochim. Acta 1, 205 (1959).
48) M. Masuda and K. Fukuda: Science 268, 1466 (1995).
49) H. Masuda, F. Hasegawa and S. Ono: J. Electrochem. Soc. 144, L 127 (1997).
50) H. Masuda, H. Yamada, M. Saitoh, H. Asoh, M. Nakao and T. Tamamura: Appl. Phys. Lett. 71, 2770 (1997).
51) E.F. Emely: “Principle of Magnesium Technology” (Pergamon Press, New York, 1966).
56) S. Ono, K. Asami, T. Osaka and N. Masuko: J. Electrochem. Soc. 143, L 62(1996).

抄録

Recent research development and fundamental aspects on the structure and growth mechanism of porous anodic films formed on aluminum and magnesium are reviewed. Thick anodic film growth proceeds with the balance of oxide formation at the metal/film interface and the field-assisted dissolution of oxide at pore bases. Hexagonal cylindrical cell structure of the film, in which cell size is nearly proportional to the formation voltage, is attained as a result of inversely proportional uniform pore distribution to the applied voltage. More exactly, cell dimension is a function of voltage and electric field strength. Electrolyte anions are incorporated into the film under the effect of electric field. Defects in porous films are formed by the drilling effect of micro-breakdown between pore bases and triple points of cells on aluminum ridges. Long-range ordering of cell arrangement of porous anodic alumina for electric devise materials is signifi-cantly improved by appropriate electrolysis voltages and chemical texturing of aluminum surface. For the anodic film growth on magnesium, the cylindrical pore structure which is similar to the Keller's model of anodic alumina is confirmed. It proceeds mainly by the formation of MgF₂ and Mg_x+y/2O_x(OH)_y at the metal/film interface and the dissolution of the film at pore bases.

責任著者(Corresponding author)

訂正情報

J-STAGEへの登録はこちら（無料）