Titanium Carbide films have been prepared by depositing alternately Ti and C thin layers from dual magnetron sputtering sources on aluminoborosilicate glass substrates. Composition, structure, hardness and other mechanical properties have been studied as a function of C/Ti flux ratio. The apparatus used in the experiment was a dual cathode sputtering machine. By rotating the substrate holder, Ti and C layers were alternately deposited on the substrate. Thickness of Ti and C layer deposited in one revolution were 0.15 nm and 0.07 nm, respectively. The C/Ti ratio of the films was controlled by changing the flux ratio of Ti and C. The XPS results showed that the C content in the films changed from 0 at% to 100 at% continuously. The XRD patterns showed that the film structure changed from α-Ti to fcc-TiC, and then, to amorphous carbon with increasing the C/Ti ratio of the films. The maximum dynamic hardness of about 16 GPa was obtained for the film deposited at a C/Ti flux ratio of 1. High adhesion strength and wear resistance were achieved for films deposited at C/Ti ratio of films over 1.