Journal of Synthetic Organic Chemistry, Japan
Online ISSN : 1883-6526
Print ISSN : 0037-9980
ISSN-L : 0037-9980
Relative Rates of Chlorine Atom Abstraction by Organosilyl Radicals
The Hxdrosilane Reduction III
Yoichiro NAGAIKazuo YAMAZAKIIsao SHIOJIMAMasaki HAYASHIHideyuki MATSUMOTO
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1968 Volume 26 Issue 11 Pages 1004-1009

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Abstract

Relative rates of chlorine atom abstraction by organosilyl radicals were determined by allowing six different polychloroalkanes to compete in pairs for an insufficient amount of triethylsilane, phenyldimethylsilane, diphenylmethylsilane and ethyldichlorosilane at 80°C in the presence of benzoyl peroxide. Relative reactivities per chlorine atom of the trichloromethyl groups in X-CCl3 towards the four organosilyl radicals are satisfactorily correlated with the Taft σ values of the substituents X. These relationships can be interpreted in terms of the polar factor which is important in determining the reactivities of the chlorine atoms in this class of substrates. In the absence of solvent, the Hammett ρ values for the reactions of triethylsilyl, phenyldimethylsilyl, diphenylmethylsilyl and ethyldichlorosilyl radicals are 0.29, 0.27, 0.29 and 0.29, respectively. It was also found that the selectivity of the reaciton in methyl ethyl ketone or methyl acetate was somewhat greater than that in cyclohexane, benzene and chlorobenzene.

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© The Society of Syhthetic Organic Chemistry, Japan
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